1 | DE10 2020 104 151 B3: Imaging Device for Electrons and Method for the Reduction of Background Signal in Electron-Optical Instruments (German patent issued 2021; with Benedikt Schoenhense, London, UK)
Patent for efficient suppression of the background signal, in particular in electron microscopes with time-of-flight energy recording. The approach (termed “Z-chicane”) uses a special dispersive element in a Fourier plane between two small field apertures for deflecting the electron beam retaining the imaging quality in the transmitted energy band. |  |
2 | DE10 2017 126 882B3: Device for the Reduction of Space-Charge Interaction in Electron-Spectroscopic Instruments (German patent issued 2019; with Benedikt Schoenhense, London, UK)
Patent for efficient suppression of the space charge interaction, in particular in electron microscopes with cathode-lens type objective lenses. The approach (termed “extraction-field tailoring”) uses a special electron-optical Ansatz for repelling slow electrons without deterioration of the imaging quality for the electrons with the desired energy. | |
3 | US 2020 / 0303177 A1: Device and Method for Electron Transfer from a Sample to an Energy Analyzer and Electron Spectrometer Device (US Patent application published Sept. 2020; with T. Kampen, S. Maehl and O. Schaff, SPECS GmbH Berlin; Foreign Priority: DE10 2019 107327.8)
Imaging device for the transport of electrons from a sample to an analyzer, comprising a single deflector between two lens groups such that the electrons are deflected in the exit plane of the imaging device in a direction perpendicular to the optical axis.
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4 | DE10 2013 005 173 B4: Device and Procedure for the Acquisition of the Momentum Distribution of Charged Particles (German patent issued 2015; with C. Tusche, A. Krasyuk and J. Kirschner, Max Planck Institute Halle)
Key patent for highly-efficient analysis of the full momentum/energy distribution of electrons released from the surface by a pulsed photon beam. The approach combines time-of-flight parallel energy recording with full-field imaging of the Fourier plane of a special lens system, optimized for maximum resolution in reciprocal space. | |
5 | DE10 2005 045 622 B4: Devices and Procedures for the Detection of the Electron Spin Polarization (German patent submitted 2005, issued 2006; Japanese patent submitted 2006; with J. Kirschner, Max Planck Institute Halle)
Key patent for spatially-resolved analysis of a 2D electron spin-polarization distribution, employing the spin sensitivity of the specular beam in low-energy electron diffraction from a target with high spin-orbit interaction or exchange interaction (e.g., a ferromagnetic film). Basic principle is the simultaneous detection of a large number N of resolved data points; N = 103 (M. Kolbe 2011); 104 (C. Tusche 2011); 105 (G. Schönhense 2016, by extending the method to 3D via time-of-flight detection). | JAP
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6 | DE 103 39 404 B4: Device for the Analysis of Electron Spin Polarization in Full-Field Imaging Electron Microscopes (German patent submitted 2003, issued 2009)
A 2D electron spin-polarization distribution is detected spatially-resolved by means of a transparent ferromagnetic foil. The method employs the spin sensitivity of the inelastic mean free path of electrons in a ferromagnetic film. | |
7 | DE102 17 507 B4; US 6,737,647 B2: Array for Achromatic Imaging of a Pulsed Particle Beam (US patent issued 2004, German patent issued 2005; together with H. Spiecker, LaVision Biotec GmbH)
Aberration-corrected imaging with pulsed beams of charged particles is achieved by means of rapidly varying lens voltages, in combination with a low-energy drift space. The pulsed electric field acts on the velocity distribution, thereby correcting chromatic aberration, and/or on the trajectories, thereby correcting spherical aberration. | US
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8 | DE10 2004 021 790 B3: Device for the Analysis of the Chemical Composition of Surfaces and Ultra-thin Films (German patent issued 2005; with M. Abraham, Nanophotonics AG)
A novel method for an efficient chemical analysis of surfaces and thin films is described. The approach can be integrated into a wafer processing line. Full-field spectroscopic imaging enables high-speed data acquisition. | |
9 | DE100 32 979 A1: Inspection Tool for EUV Lithography Masks and Multilayer Mirrors (German patent issued 2002; together with U. Kleineberg, Bielefeld)
Inspection tool for EUV lithography equipment is based on a full-field imaging photoelectron microscope. It comprises a broadband mirror, inserted in the backfocal plane of a special objective lens. In this way, the correct angle of incidence is realized, so that the full wave field can be analyzed under „in-operando“ conditions. | |
List of Publications | |